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Characterization of electron beam deposited thin films of HfO2 and binary thin films of (HfO2:SiO2) by XRD and EXAFS measurements

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BookPublisher: Mumbai Bhabha Atomic Research Centre 2009Description: 39p.Subject(s): Thin FilmsDDC classification: BARC | E/023/2009

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Item type	Current location	Collection	Call number	Status	Date due	Barcode	Item holds
Technical Report	PK Kelkar Library, IIT Kanpur	General Stacks	BARC E/023/2009 (Browse shelf)	Not for loan		TR21026

Total holds: 0

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