BARC / E/023/2009
Characterization of electron beam deposited thin films of HfO2 and binary thin films of (HfO2:SiO2) by XRD and EXAFS measurements / N.C. Das ...[et al.] .- Mumbai: Bhabha Atomic Research Centre, 2009 .- 39p .
Barc Report
Subject Headings:
Thin Films;
Author Added Entry:
Das, N.C.;
Copy Details:
Acc. No.: TR21026, Full Call No.: BARC E/023/2009, Item type: Technical Report , Location: General Stacks,
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Characterization of electron beam deposited thin films of HfO2 and binary thin films of (HfO2:SiO2) by XRD and EXAFS measurements / N.C. Das ...[et al.] .- Mumbai: Bhabha Atomic Research Centre, 2009 .- 39p .
Barc Report
Subject Headings:
Thin Films;
Author Added Entry:
Das, N.C.;
Copy Details:
Acc. No.: TR21026, Full Call No.: BARC E/023/2009, Item type: Technical Report , Location: General Stacks,
------------------------- --------------------- ------ --------- ------- ------- --------- --------