Characterization of electron beam deposited thin films of HfO2 and binary thin films of (HfO2:SiO2) by XRD and EXAFS measurements
By: .
Contributor(s): Das, N.C.
Material type:
BookPublisher: Mumbai Bhabha Atomic Research Centre 2009Description: 39p.Subject(s): Thin FilmsDDC classification: BARC | E/023/2009
| Item type | Current location | Collection | Call number | Status | Date due | Barcode | Item holds |
|---|---|---|---|---|---|---|---|
Technical Report
|
PK Kelkar Library, IIT Kanpur | General Stacks | BARC E/023/2009 (Browse shelf) | Not for loan | TR21026 |
Total holds: 0
Barc Report
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