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Low substrate temperature modeling outlook of scaled n-MOSFET / (Record no. 562310)

000 -LEADER
fixed length control field 07097nam a22007571i 4500
001 - CONTROL NUMBER
control field 8411421
003 - CONTROL NUMBER IDENTIFIER
control field IEEE
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20200413152926.0
006 - FIXED-LENGTH DATA ELEMENTS--ADDITIONAL MATERIAL CHARACTERISTICS
fixed length control field m eo d
007 - PHYSICAL DESCRIPTION FIXED FIELD--GENERAL INFORMATION
fixed length control field cr cn |||m|||a
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 180801s2018 caua foab 000 0 eng d
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 9781681733869
Qualifying information ebook
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
Canceled/invalid ISBN 9781681733876
Qualifying information hardcover
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
Canceled/invalid ISBN 9781681733852
Qualifying information paperback
024 7# - OTHER STANDARD IDENTIFIER
Standard number or code 10.2200/S00858ED1V01Y201805EET010
Source of number or code doi
035 ## - SYSTEM CONTROL NUMBER
System control number (CaBNVSL)swl000408591
035 ## - SYSTEM CONTROL NUMBER
System control number (OCoLC)1047603338
040 ## - CATALOGING SOURCE
Original cataloging agency CaBNVSL
Language of cataloging eng
Description conventions rda
Transcribing agency CaBNVSL
Modifying agency CaBNVSL
050 #4 - LIBRARY OF CONGRESS CALL NUMBER
Classification number TP482
Item number .A834 2018
082 04 - DEWEY DECIMAL CLASSIFICATION NUMBER
Classification number 621.59
Edition number 23
100 1# - MAIN ENTRY--PERSONAL NAME
Personal name Ashraf, Nabil Shovon,
Dates associated with a name 1974-,
Relator term author.
245 10 - TITLE STATEMENT
Title Low substrate temperature modeling outlook of scaled n-MOSFET /
Statement of responsibility, etc. Nabil Shovon Ashraf.
264 #1 - PRODUCTION, PUBLICATION, DISTRIBUTION, MANUFACTURE, AND COPYRIGHT NOTICE
Place of production, publication, distribution, manufacture [San Rafael, California] :
Name of producer, publisher, distributor, manufacturer Morgan & Claypool,
Date of production, publication, distribution, manufacture, or copyright notice 2018.
300 ## - PHYSICAL DESCRIPTION
Extent 1 PDF (xi, 77 pages) :
Other physical details illustrations.
336 ## - CONTENT TYPE
Content type term text
Source rdacontent
337 ## - MEDIA TYPE
Media type term electronic
Source isbdmedia
338 ## - CARRIER TYPE
Carrier type term online resource
Source rdacarrier
490 1# - SERIES STATEMENT
Series statement Synthesis lectures on emerging engineering technologies,
International Standard Serial Number 2381-1439 ;
Volume/sequential designation # 10
538 ## - SYSTEM DETAILS NOTE
System details note Mode of access: World Wide Web.
538 ## - SYSTEM DETAILS NOTE
System details note System requirements: Adobe Acrobat Reader.
500 ## - GENERAL NOTE
General note Part of: Synthesis digital library of engineering and computer science.
504 ## - BIBLIOGRAPHY, ETC. NOTE
Bibliography, etc. note Includes bibliographical references (pages 65-76).
505 0# - FORMATTED CONTENTS NOTE
Formatted contents note 1. Introduction --
505 8# - FORMATTED CONTENTS NOTE
Formatted contents note 2. Historical perspectives of scaled MOSFET evolution --
505 8# - FORMATTED CONTENTS NOTE
Formatted contents note 3. Simulation results of on-state drain current and subthreshold drain current at substrate temperatures below 300 K -- 3.1 Modeling equations to derive on-state drain current as a function of drain voltage for different gate voltages operated at reduced substrate temperatures below 300 K -- 3.1.1 Modeling of substrate or bulk mobility as a function of substrate temperature for 1 [mu]m channel length MOSFET -- 3.1.2 Modeling of drain current as a function of drain voltage for different gate voltage biases at different substrate temperatures -- 3.1.3 Modeling of drain current as a function of substrate temperatures for different gate voltage and drain biases conditions for a long-channel n-MOSFET -- 3.2 Drain current as a function of gate voltage for a fixed low-drain voltage at different substrate temperatures for the 1 [mu]m channel length n-MOSFET [mu]m --
505 8# - FORMATTED CONTENTS NOTE
Formatted contents note 4. Simulation results on substrate mobility and on-channel mobility of conventional long-channel n-MOSFET at substrate temperatures 300 K and below -- 4.1 Electron mobility in p-type substrate of silicon varying with substrate acceptor doping concentrations for different substrate temperatures -- 4.2 Simulation results of electron carrier mobility at the surface of an n-channel MOSFET for different substrate temperatures -- 4.2.1 Modeling equations for extraction of surface mobility as a function of vertical effective field --
505 8# - FORMATTED CONTENTS NOTE
Formatted contents note 5. Simulation outcomes of subthreshold slope factor or coefficient for different substrate temperatures at the vicinity of a subthreshold region to deep subthreshold region of a long-channel n-MOSFET --
505 8# - FORMATTED CONTENTS NOTE
Formatted contents note 6. Review of scaled device architectures for their feasibility to low temperature operation simulation perspectives of the author's current research -- 6.1 Silicon nanowire transistor performance analysis with consideration of low-temperature operation -- 6.2 Negative capacitance ferroelectric Fet (Ncfet) performance analysis with consideration of low-temperature operation --
505 8# - FORMATTED CONTENTS NOTE
Formatted contents note 7. Summary of research results and conclusions -- References -- Author's biography.
506 ## - RESTRICTIONS ON ACCESS NOTE
Terms governing access Abstract freely available; full-text restricted to subscribers or individual document purchasers.
510 0# - CITATION/REFERENCES NOTE
Name of source Compendex
510 0# - CITATION/REFERENCES NOTE
Name of source INSPEC
510 0# - CITATION/REFERENCES NOTE
Name of source Google scholar
510 0# - CITATION/REFERENCES NOTE
Name of source Google book search
520 3# - SUMMARY, ETC.
Summary, etc. Low substrate/lattice temperature (< 300 K) operation of n-MOSFET has been effectively studied by device research and integration professionals in CMOS logic and analog products from the early 1970s. The author of this book previously composed an e-book [1] in this area where he and his co-authors performed original simulation and modeling work on MOSFET threshold voltage and demonstrated that through efficient manipulation of threshold voltage values at lower substrate temperatures, superior degrees of reduction of subthreshold and off-state leakage current can be implemented in high-density logic and microprocessor chips fabricated in a silicon die. In this book, the author explores other device parameters such as channel inversion carrier mobility and its characteristic evolution as temperature on the die varies from 100-300 K. Channel mobility affects both on-state drain current and subthreshold drain current and both drain current behaviors at lower temperatures have been modeled accurately and simulated for a 1 m channel length n-MOSFET. In addition, subthreshold slope which is an indicator of how speedily the device drain current can be switched between near off current and maximum drain current is an important device attribute to model at lower operating substrate temperatures. This book is the first to illustrate the fact that a single subthreshold slope value which is generally reported in textbook plots and research articles, is erroneous and at lower gate voltage below inversion, subthreshold slope value exhibits a variation tendency on applied gate voltage below threshold, i.e., varying depletion layer and vertical field induced surface band bending variations at the MOSFET channel surface. The author also will critically review the state-of-the art effectiveness of certain device architectures presently prevalent in the semiconductor industry below 45 nm node from the perspectives of device physical analysis at lower substrate temperature operating conditions. The book concludes with an emphasis on modeling simulations, inviting the device professionals to meet the performance bottlenecks emanating from inceptives present at these lower temperatures of operation of today's 10 nm device architectures.
530 ## - ADDITIONAL PHYSICAL FORM AVAILABLE NOTE
Additional physical form available note Also available in print.
588 ## - SOURCE OF DESCRIPTION NOTE
Source of description note Title from PDF title page (viewed on August 1, 2018).
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Low temperature engineering.
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Metal oxide semiconductor field-effect transistors.
653 ## - INDEX TERM--UNCONTROLLED
Uncontrolled term threshold voltage
653 ## - INDEX TERM--UNCONTROLLED
Uncontrolled term substrate temperature
653 ## - INDEX TERM--UNCONTROLLED
Uncontrolled term on-state drain current
653 ## - INDEX TERM--UNCONTROLLED
Uncontrolled term subthreshold leakage current
653 ## - INDEX TERM--UNCONTROLLED
Uncontrolled term bulk mobility
653 ## - INDEX TERM--UNCONTROLLED
Uncontrolled term channel mobility
653 ## - INDEX TERM--UNCONTROLLED
Uncontrolled term surface potential
653 ## - INDEX TERM--UNCONTROLLED
Uncontrolled term inversion charge density
653 ## - INDEX TERM--UNCONTROLLED
Uncontrolled term subthreshold slope
653 ## - INDEX TERM--UNCONTROLLED
Uncontrolled term Tunnel FET
653 ## - INDEX TERM--UNCONTROLLED
Uncontrolled term silicon nanowire FET
653 ## - INDEX TERM--UNCONTROLLED
Uncontrolled term ferroelectric FET
776 08 - ADDITIONAL PHYSICAL FORM ENTRY
Relationship information Print version:
International Standard Book Number 9781681733852
-- 9781681733876
830 #0 - SERIES ADDED ENTRY--UNIFORM TITLE
Uniform title Synthesis digital library of engineering and computer science.
830 #0 - SERIES ADDED ENTRY--UNIFORM TITLE
Uniform title Synthesis lectures on emerging engineering technologies ;
Volume/sequential designation # 10.
International Standard Serial Number 2381-1439
856 42 - ELECTRONIC LOCATION AND ACCESS
Materials specified Abstract with links to resource
Uniform Resource Identifier https://ieeexplore.ieee.org/servlet/opac?bknumber=8411421
Holdings
Withdrawn status Lost status Damaged status Not for loan Permanent Location Current Location Date acquired Barcode Date last seen Price effective from Koha item type
        PK Kelkar Library, IIT Kanpur PK Kelkar Library, IIT Kanpur 2020-04-13 EBKE810 2020-04-13 2020-04-13 E books

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