SCIENTIFIC WET PROCESS TECHNOLOGY FOR INNOVATIVE LSI/FPD MANUFACTURING
By: Ohmi,Tadahiro.
Material type:![materialTypeLabel](/opac-tmpl/lib/famfamfam/BK.png)
Item type | Current location | Collection | Call number | Status | Date due | Barcode | Item holds |
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PK Kelkar Library, IIT Kanpur | General Stacks | 621.38152 SC27O (Browse shelf) | Available | A155221 |
Total holds: 0
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621.38152 R279 RALIABILITY AND DEGRADATION | 621.38152 R591m The materials science of semiconductors | 621.38152 R932N NITRIDE SEMICONDUCTORS | 621.38152 SC27O SCIENTIFIC WET PROCESS TECHNOLOGY FOR INNOVATIVE LSI/FPD MANUFACTURING | 621.38152 Sch22c Chalcogenide photovoltaics | 621.38152 SE39C CMOS ELECTRONICS | 621.38152 Se48a ANALYSIS AND SIMULATION OF SEMICONDUCTOR DEVICES |
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