Plasma techniques for film deposition
By: Konuma, Mitsuharu.
Material type:
BookPublisher: Harrow Alpha Science International Ltd. 2005Description: ix, 337p.ISBN: 184265151X.Subject(s): Thin Films | Plasma-Enhanced Chemical Vapor DepositionDDC classification: 621.38152 | K837p
| Item type | Current location | Collection | Call number | url | Status | Date due | Barcode | Item holds |
|---|---|---|---|---|---|---|---|---|
Books
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PK Kelkar Library, IIT Kanpur | COMPACT STORAGE (BASEMENT) | 621.38152 K837p (Browse shelf) | Book Request | Available | A155878 |
Total holds: 0
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| 621.38152 K131c CHARACTERIZATION OF SEMICONDUCTOR MATERIALS | 621.38152 K131c CHARACTERIZATION OF SEMICONDUCTOR MATERIALS | 621.38152 K133G GALLIUM ARSENIDE DIGITAL INTEGRATED CIRCUITS | 621.38152 K837p Plasma techniques for film deposition | 621.38152 K868P POSITRON ANNIHILATION IN SEMICONDUCTORS | 621.38152 K95p POWER SEMICONDUCTORS | 621.38152 L324r RADIATION EFFECTS IN SEMICONDUCTOR DEVICES |
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