PLASMA PROCESSES FOR SEMICONDUCTOR FABRICATION
By: Hitchon,W. N.G.
Material type:
BookSeries: Cambridge Studies In Semiconductor Physics And Microelectronic Engineering. Publisher: Cambridge Univ. Press, Cambridge 1999Description: ix,221.ISBN: 0521591759.Subject(s): Semiconductors -- Ething | Plasma EthingDDC classification: 621.38152 | H637P
| Item type | Current location | Collection | Call number | Status | Date due | Barcode | Item holds |
|---|---|---|---|---|---|---|---|
Books
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PK Kelkar Library, IIT Kanpur | General Stacks | 621.38152 H637P (Browse shelf) | Available | A128874 |
Total holds: 0
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| 621.38152 H256S SEMICONDUCTING TRANSPARENT THIN FILMS | 621.38152 H537 HIGH SPEED CMOS DESIGN STYLES | 621.38152 H537 High-energy ball milling | 621.38152 H637P PLASMA PROCESSES FOR SEMICONDUCTOR FABRICATION | 621.38152 H665 SEMICONDUCTOR MEMORIES | 621.38152 H678s SEMICONDUCTOR POWER ELECTRONICS | 621.38152 H738 PHYSICAL PRINCIPLES OF SOLID STATE DEVICES |
Includes Bibliographical References And Index
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