PLASMA DEPOSITION OF AMORPHOUS SILICON-BASED MATERIALS
By: Giovanni No Bruno,Pio No Capezzuto,Arun No Madan.
Contributor(s): Madan,Arun.
Material type:
BookSeries: Plasma-Materials Interactions. Publisher: Academic Press, Boston 1995Description: xi,324.ISBN: 012137940X.Subject(s): Amorphous Semiconductors -- Design And Construction | Silicon Alloys | Plasma-Enhanced Chemical Vapor DepositionDDC classification: 621.38152 | P695
| Item type | Current location | Collection | Call number | Status | Date due | Barcode | Item holds |
|---|---|---|---|---|---|---|---|
Books
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PK Kelkar Library, IIT Kanpur | General Stacks | 621.38152 P695 (Browse shelf) | Available | A123102 |
Total holds: 0
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| 621.38152 P275u UNDERSTANDING SEMICONDUCTOR DEVICES | 621.38152 P289c CMOS SRAM circuit design and parametric test in nano-scaled technologies | 621.38152 P566 Photonic crystals | 621.38152 P695 PLASMA DEPOSITION OF AMORPHOUS SILICON-BASED MATERIALS | 621.38152 P871 Power/HVMOS devices compact modeling | 621.38152 P871P PVD FOR MICROELECTRONICS | 621.38152 P871TE POWER ELECTRONICS |
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