USE OF MULTIPLE PHOTOEXCITATION IN AN OPTICALLY THICK SILICON-ALUMINUM PLASMA TO OBTAIN LASING AT 44 A
By: Apruzese,J P, Whitney,K G.
Contributor(s): Davis,J.
Material type: BookSeries: Nrl Memorandum Report. Publisher: National Social Science Documentation Centre,New 1978Description: iii.Subject(s): Metallography | X-Rays --Industrial ApplicationsDDC classification: 669.950 | AP69UItem type | Current location | Collection | Call number | url | Status | Date due | Barcode | Item holds |
---|---|---|---|---|---|---|---|---|
Books | PK Kelkar Library, IIT Kanpur | COMPACT STORAGE (BASEMENT) | 669.950 AP69U (Browse shelf) | Book Request | Available | A64055 |
Total holds: 0
Browsing PK Kelkar Library, IIT Kanpur Shelves , Collection code: COMPACT STORAGE (BASEMENT) Close shelf browser
669.94028 C76 COMPUTATIONAL TECHNIQUES ON AN AID IN PHYSICAL METALLURGY | 669.95 Al57 ALLOY DESIGN | 669.95 Ap58 APPLIED METALLOGRAPHY | 669.950 AP69U USE OF MULTIPLE PHOTOEXCITATION IN AN OPTICALLY THICK SILICON-ALUMINUM PLASMA TO OBTAIN LASING AT 44 A | 669.95 B455m MAGNETISM AND METALLURGY | 669.95 B455m MAGNETISM AND METALLURGY | 669.95 B669s SPECTROSCOPY IN THE METALLURGICAL INDUSTRY |
Reprinted By Ntis
There are no comments for this item.