USE OF MULTIPLE PHOTOEXCITATION IN AN OPTICALLY THICK SILICON-ALUMINUM PLASMA TO OBTAIN LASING AT 44 A
By: Apruzese,J P, Whitney,K G.
Contributor(s): Davis,J.
Material type:
BookSeries: Nrl Memorandum Report. Publisher: National Social Science Documentation Centre,New 1978Description: iii.Subject(s): Metallography | X-Rays --Industrial ApplicationsDDC classification: 669.950 | AP69U
| Item type | Current location | Collection | Call number | url | Status | Date due | Barcode | Item holds |
|---|---|---|---|---|---|---|---|---|
Books
|
PK Kelkar Library, IIT Kanpur | COMPACT STORAGE (BASEMENT) | 669.950 AP69U (Browse shelf) | Book Request | Available | A64055 |
Total holds: 0
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