000			03878nam a22005655i 4500
001			978-0-387-29261-8
003			DE-He213
005			20161121231134.0
007			cr nn 008mamaa
008			100301s2007 xxu| s |||| 0|eng d
020			_a9780387292618 _9978-0-387-29261-8
024	7		_a10.1007/978-0-387-29261-8 _2doi
050		4	_aTA404.6
072		7	_aTGMT _2bicssc
072		7	_aTEC021000 _2bisacsh
082	0	4	_a620.11 _223
100	1		_aAlford, Terry L. _eauthor.
245	1	0	_aFundamentals of Nanoscale Film Analysis _h[electronic resource] / _cby Terry L. Alford, Leonard C. Feldman, James W. Mayer.
264		1	_aBoston, MA : _bSpringer US, _c2007.
300			_aXIV, 336 p. _bonline resource.
336			_atext _btxt _2rdacontent
337			_acomputer _bc _2rdamedia
338			_aonline resource _bcr _2rdacarrier
347			_atext file _bPDF _2rda
505	0		_aAn Overview: Concepts, Units, and the Bohr Atom -- Atomic Collisions and Backscattering Spectrometry -- Energy Loss of Light Ions and Backscattering Depth Profiles -- Sputter Depth Profiles and Secondary Ion Mass Spectroscopy -- Ion Channeling -- Electron-Electron Interactions and the Depth Sensitivity of Electron Spectroscopies -- X-ray Diffraction -- Electron Diffraction -- Photon Absorption in Solids and EXAFS -- X-ray Photoelectron Spectroscopy -- Radiative Transitions and the Electron Microprobe -- Nonradiative Transitions and Auger Electron Spectroscopy -- Nuclear Techniques: Activation Analysis and Prompt Radiation Analysis -- Scanning Probe Microscopy.
520			_aModern science and technology, from materials science to integrated circuit development, is directed toward the nanoscale. From thin films to field effect transistors, the emphasis is on reducing dimensions from the micro to the nanoscale. Fundamentals of Nanoscale Film Analysis concentrates on analysis of the structure and composition of the surface and the outer few tens to hundred nanometers in depth. It describes characterization techniques to quantify the structure, composition and depth distribution of materials with the use of energetic particles and photons. The book describes the fundamentals of materials characterization from the standpoint of the incident photons or particles which interrogate nanoscale structures. These induced reactions lead to the emission of a variety of detected of particles and photons. It is the energy and intensity of the detected beams that is the basis of the characterization of the materials. The array of experimental techniques used in nanoscale materials analysis covers a wide range of incident particle and detected beam interactions. Included are such important interactions as atomic collisions, Rutherford backscattering, ion channeling, diffraction, photon absorption, radiative and nonradiative transitions, and nuclear reactions. A variety of analytical and scanning probe microscopy techniques are presented in detail.
650		0	_aMaterials science.
650		0	_aCondensed matter.
650		0	_aSolid state physics.
650		0	_aSpectroscopy.
650		0	_aMicroscopy.
650		0	_aNanotechnology.
650		0	_aMaterials _xSurfaces.
650		0	_aThin films.
650	1	4	_aMaterials Science.
650	2	4	_aCharacterization and Evaluation of Materials.
650	2	4	_aSurfaces and Interfaces, Thin Films.
650	2	4	_aNanotechnology.
650	2	4	_aSolid State Physics.
650	2	4	_aSpectroscopy and Microscopy.
650	2	4	_aCondensed Matter Physics.
700	1		_aFeldman, Leonard C. _eauthor.
700	1		_aMayer, James W. _eauthor.
710	2		_aSpringerLink (Online service)
773	0		_tSpringer eBooks
776	0	8	_iPrinted edition: _z9780387292601
856	4	0	_uhttp://dx.doi.org/10.1007/978-0-387-29261-8
912			_aZDB-2-CMS
950			_aChemistry and Materials Science (Springer-11644)
999			_c509139 _d509139