000 | 03335nam a22005055i 4500 | ||
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001 | 978-3-540-29499-3 | ||
003 | DE-He213 | ||
005 | 20161121231102.0 | ||
007 | cr nn 008mamaa | ||
008 | 100301s2005 gw | s |||| 0|eng d | ||
020 |
_a9783540294993 _9978-3-540-29499-3 |
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024 | 7 |
_a10.1007/3-540-29499-6 _2doi |
|
050 | 4 | _aTA1750-1750.22 | |
072 | 7 |
_aTJFD _2bicssc |
|
072 | 7 |
_aTEC021000 _2bisacsh |
|
072 | 7 |
_aTEC008080 _2bisacsh |
|
082 | 0 | 4 |
_a620.11295 _223 |
082 | 0 | 4 |
_a620.11297 _223 |
100 | 1 |
_aPerevoschikov, Victor A. _eauthor. |
|
245 | 1 | 0 |
_aGettering Defects in Semiconductors _h[electronic resource] / _cby Victor A. Perevoschikov, Vladimir D. Skoupov. |
264 | 1 |
_aBerlin, Heidelberg : _bSpringer Berlin Heidelberg, _c2005. |
|
300 |
_aXVI, 388 p. 70 illus. _bonline resource. |
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336 |
_atext _btxt _2rdacontent |
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337 |
_acomputer _bc _2rdamedia |
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338 |
_aonline resource _bcr _2rdacarrier |
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347 |
_atext file _bPDF _2rda |
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490 | 1 |
_aSpringer Series in Advanced Microelectronics, _x1437-0387 ; _v19 |
|
505 | 0 | _aBasic technological processes and defect formation in the components of device structures -- Effects of defects on electrophysical and functional parameters in semiconducting structures and devices -- Techniques for high-temperature gettering -- Physical foundations for low-temperature gettering techniques. | |
520 | _aGettering Defects in Semiconductors fulfills three basic purposes: – to systematize the experience and research in exploiting various gettering techniques in microelectronics and nanoelectronics; – to identify new directions in research, particularly to enhance the perspective of professionals and young researchers and specialists; – to fill a gap in the contemporary literature on the underlying semiconductor-material theory. The authors address not only well-established gettering techniques but also describe contemporary trends in gettering technologies from an international perspective. The types and properties of structural defects in semiconductors, their generating and their transforming mechanisms during fabrication are described. The primary emphasis is placed on classifying and describing specific gettering techniques, their specificity arising from both their position in a general technological process and the regimes of their application. This book addresses both engineers and material scientists interested in semiconducting materials theory and also undergraduate and graduate students in solid–state microelectronics and nanoelectronics. A comprehensive list of references provides readers with direction for further reading. | ||
650 | 0 | _aMaterials science. | |
650 | 0 | _aChemical engineering. | |
650 | 0 | _aOptical materials. | |
650 | 0 | _aElectronic materials. | |
650 | 1 | 4 | _aMaterials Science. |
650 | 2 | 4 | _aOptical and Electronic Materials. |
650 | 2 | 4 | _aIndustrial Chemistry/Chemical Engineering. |
700 | 1 |
_aSkoupov, Vladimir D. _eauthor. |
|
710 | 2 | _aSpringerLink (Online service) | |
773 | 0 | _tSpringer eBooks | |
776 | 0 | 8 |
_iPrinted edition: _z9783540262442 |
830 | 0 |
_aSpringer Series in Advanced Microelectronics, _x1437-0387 ; _v19 |
|
856 | 4 | 0 | _uhttp://dx.doi.org/10.1007/3-540-29499-6 |
912 | _aZDB-2-CMS | ||
950 | _aChemistry and Materials Science (Springer-11644) | ||
999 |
_c508336 _d508336 |