000 00489pam a2200169a 44500
008 160408b2008 xxu||||| |||| 00| 0 eng d
020 _a9783540766629
082 _a621.38152
_bR22
100 _a
245 1 _aReactive sputter deposition
_cedited by D. Depla
260 _aBerlin
_bSpringer
_c2008
300 _axviii, 570p.
440 _aSpringer Series In Materials Science
_v
650 _aCathode Sputtering (Plating Process)
700 _aMahieu, S.,Ed.
997 _aA161826 s C
999 _c361195
_d361195