| 000 | 00488pam a2200169a 44500 | ||
|---|---|---|---|
| 008 | 160408bc2002 xxu||||| |||| 00| 0 eng d | ||
| 020 | _a0444510958 | ||
| 082 |
_a530.044 _bAD95 |
||
| 100 | _aT Makabe,No | ||
| 245 | 1 |
_aADVANCES IN LOW TEMPERATURE RF PLASMAS _cBASIS FOR PROCESS DESIGN |
|
| 260 |
_a _bElsevier, Amsterdam _cc2002 |
||
| 300 | _axii,341 | ||
| 650 | _aLow Temperature Plasmas -- Industrial Applications | ||
| 700 | _aMakabe,T | ||
| 964 | _gCIRC | ||
| 997 | _aA141744 C | ||
| 999 |
_c343163 _d343163 |
||