000 00484pam a2200193a 44500
008 160408b1992 xxu||||| |||| 00| 0 eng d
020 _a0471550833
082 _a671.735
_bEd28p
100 _aEden, J. G.
245 1 _aPHOTOCHEMICAL VAPOR DEPOSITION
260 _aNew York
_bWiley
_c1992
300 _axi,193
440 _aChemical Analysis
_vV. 122
650 _aVapor-Plating
650 _aThin Films
650 _aPhotochemistry
964 _gCIRC
997 _aA115297 C
999 _c327517
_d327517