| 000 | 00645pam a2200205a 44500 | ||
|---|---|---|---|
| 008 | 160408b1989 xxu||||| |||| 00| 0 eng d | ||
| 020 | _a0841214751 | ||
| 082 |
_a621.381 _bM583 |
||
| 100 | _aHess, Dennis W. | ||
| 245 | 1 |
_aMICROELECTRONICS PROCESSING _cCHEMICAL ENGINEERING ASPECTS |
|
| 260 |
_aWashington, D. C. _bAmerican Chemical Society _c1989 |
||
| 300 | _axiv,547 | ||
| 440 |
_aAdvances In Chemistry Series _vNo. 221 |
||
| 650 | _aMicroelectronics -- Materials | ||
| 650 | _aIntegrated Circuits -- Design And Construction | ||
| 650 | _aSurface Chemistry | ||
| 700 | _aJensen, Klavs F. | ||
| 964 | _gCIRC | ||
| 997 | _aA107140 s C | ||
| 999 |
_c324830 _d324830 |
||