| 000 | 00616pam a2200205a 44500 | ||
|---|---|---|---|
| 008 | 160408b1986 xxu||||| |||| 00| 0 eng d | ||
| 020 | _a0841214069 | ||
| 082 |
_a668.9 _bP769 |
||
| 100 | _aBowden, Murrae | ||
| 245 | 1 |
_aPOLYMERS AND HIGH TECHNOLOGY _cELECTRONICS AND PHOTONICS |
|
| 260 |
_aAnaheim _bCalifornia _c1986 |
||
| 300 | _ax,628 | ||
| 440 |
_aAcs Symposium Series, Issn 0097-6156-346 _v |
||
| 650 | _aPolymers And Polymerization -- Cong | ||
| 650 | _aPhotoresists -- Cong | ||
| 650 | _aMicrolithography-Materials -- Cong | ||
| 700 | _aTurner, S. Richard | ||
| 964 | _gCIRC | ||
| 997 | _aA106684 C | ||
| 999 |
_c315269 _d315269 |
||