| 000 | 00449pam a2200169a 44500 | ||
|---|---|---|---|
| 008 | 160408b1975 xxu||||| |||| 00| 0 eng d | ||
| 082 |
_a621.38173 _bD362p |
||
| 100 | _aDeforest, W. S. | ||
| 245 | 1 |
_aPHOTORESIST _cMATERIALS AND PROCESSES |
|
| 260 |
_aNew York _bMcgraw-Hill _c1975 |
||
| 300 | _a269 | ||
| 500 | _aBibliographical References | ||
| 650 | _aPhotoresist | ||
| 650 | _aIntegrated Circuits | ||
| 964 | _gCIRC | ||
| 997 | _aA53856 s C | ||
| 999 |
_c306178 _d306178 |
||