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1.
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PLASMA DEPOSITION OF AMORPHOUS SILICON-BASED MATERIALS
by Giovanni No Bruno,Pio No Capezzuto,Arun No Madan | Madan,Arun. Material type:  Book; Format:
print
; Literary form:
not fiction
Description: xi,324.Publisher: Academic Press, Boston 1995Availability: Items available for loan: PK Kelkar Library, IIT Kanpur [Call number: 621.38152 P695] (1).
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2.
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DEPOSITION OF DIAMOND-LIKE SUPERHARD MATERIALS
by Kulisch,Wilhelm. Material type: Book; Format:
print
; Literary form:
not fiction
Description: x,191.Publisher: Springer-Verlag,Berlin 1999Availability: Items available for loan: PK Kelkar Library, IIT Kanpur [Call number: 666.88 K959D] (1).
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3.
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AMORPHOUS SILICON TECHNOLOGY - 1996
by Michael No Hack | Hack,Michael. Material type: Book; Format:
print
; Literary form:
not fiction
Description: xviii,909.Publisher: Materials Research Society, Pittsburgh 1996Availability: Items available for loan: PK Kelkar Library, IIT Kanpur [Call number: 621.38152 AM68] (1).
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4.
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Plasma techniques for film deposition
by Konuma, Mitsuharu. Material type: Book; Format:
print
; Literary form:
not fiction
Description: ix, 337p.Publisher: Harrow Alpha Science International Ltd. 2005Availability: Items available for loan: PK Kelkar Library, IIT Kanpur [Call number: 621.38152 K837p] (1).
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5.
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Physics and applications of CVD diamond
by | Koizumi, Satoshi, Ed. Material type: Book; Format:
print
; Literary form:
not fiction
Description: xii, 362p.Publisher: Weinheim Wiley Vch 2008Availability: Items available for loan: PK Kelkar Library, IIT Kanpur [Call number: 621.38152 P569] (1).
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6.
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Chemical vapour deposition
: an integrated engineering design for advanced materials
by Xu, Yongdong | Yan, Xiu-Tian. Material type: Book; Format:
print
; Literary form:
not fiction
Description: xiv, 342p.Publisher: London Springer 2010Availability: Items available for loan: PK Kelkar Library, IIT Kanpur [Call number: 671.735 X8c] (1).
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7.
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The MOCVD challenge
: a survey of GaInAsP-InP and GaInAsP-GaAs for photonic and electronic device applications
by Razeghi, Manijeh. Edition: 2ndMaterial type: Book; Format:
print
; Literary form:
not fiction
Description: xx, 779p.Publisher: Boca Raton Crc Press 2011Availability: Items available for loan: PK Kelkar Library, IIT Kanpur [Call number: 621.381 R219m2] (1).
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8.
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Chemical vapour deposition
: precursors, processes and applications
by | Jones, Anthony C., Ed | Michael L. Hitchman, Ed. Material type: Book; Format:
print
; Literary form:
not fiction
Description: xv, 582p.Publisher: Cambridge Royal Society Of Chemistry 2009Availability: Items available for loan: PK Kelkar Library, IIT Kanpur [Call number: 671.735 C42] (1).
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9.
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Chemical vapor deposition of aluminide coatings on iron, nickel and superalloys
by John, John T | De, P.K | Bhabha Atomic Research Centre BARC. Material type: Book Description: 37p.Publisher: Mumbai, India Bhabha Atomic Research Centre 2009Availability: Items available for reference: PK Kelkar Library, IIT Kanpur [Call number: BARC E/022/2009] (1).
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