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Applied Charged Particle Optics

By: Liebl, Helmut [author.].
Contributor(s): SpringerLink (Online service).
Material type: materialTypeLabelBookPublisher: Berlin, Heidelberg : Springer Berlin Heidelberg, 2008.Description: X, 131 p. online resource.Content type: text Media type: computer Carrier type: online resourceISBN: 9783540719250.Subject(s): Physics | Optics | Optoelectronics | Plasmons (Physics) | Engineering | Physics | Optics, Optoelectronics, Plasmonics and Optical Devices | Engineering, generalDDC classification: 621.36 Online resources: Click here to access online
Contents:
Lenses: Basic Optics -- Electrostatic Deflection -- Magnetic Deflection -- Image Aberrations -- Fringe Field Confinement.
In: Springer eBooksSummary: Authored by a pioneer of the field, this overview of charged particle optics provides a solid introduction to the field for all physicists wishing to design their own apparatus or better understand the instruments with which they work. Applied Charged Particle Optics begins by introducing electrostatic lenses and fields used for acceleration, focussing and deflection of ions or electrons. Subsequent chapters give detailed descriptions of electrostatic deflection elements, uniform and non-uniform magnetic sector fields, image aberrations, and, finally, fringe field confinement. A chapter on applications is added.
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E books E books PK Kelkar Library, IIT Kanpur
Available EBK8315
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Lenses: Basic Optics -- Electrostatic Deflection -- Magnetic Deflection -- Image Aberrations -- Fringe Field Confinement.

Authored by a pioneer of the field, this overview of charged particle optics provides a solid introduction to the field for all physicists wishing to design their own apparatus or better understand the instruments with which they work. Applied Charged Particle Optics begins by introducing electrostatic lenses and fields used for acceleration, focussing and deflection of ions or electrons. Subsequent chapters give detailed descriptions of electrostatic deflection elements, uniform and non-uniform magnetic sector fields, image aberrations, and, finally, fringe field confinement. A chapter on applications is added.

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