Chemical vapour deposition : precursors, processes and applications
By: .
Contributor(s): Jones, Anthony C., Ed | Michael L. Hitchman, Ed.
Material type: BookPublisher: Cambridge Royal Society Of Chemistry 2009Description: xv, 582p.ISBN: 9780854044658.Subject(s): Chemical vapor depositionDDC classification: 671.735 | C42Item type | Current location | Collection | Call number | Status | Date due | Barcode | Item holds |
---|---|---|---|---|---|---|---|
Books | PK Kelkar Library, IIT Kanpur | General Stacks | 671.735 C42 (Browse shelf) | Available | A180562 |
Total holds: 0
Browsing PK Kelkar Library, IIT Kanpur Shelves , Collection code: General Stacks Close shelf browser
671.734 SO12H HIGH VELOCITY OXY-FUEL SPRAYING | 671.734 T343 THERMAL SPRAYING FOR POWER GENERATION COMPONENTS | 671.735 C355v CHEMICAL VAPOR DEPOSITION | 671.735 C42 Chemical vapour deposition | 671.735 M436h2 Handbook of physical vapor deposition (PVD) processing | 671.735 M829t THIN FILM BY CHEMICAL VAPOUR DEPOSITION | 671.735 P871v VAPOR DEPOSITION |
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