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Reactive sputter deposition (Record no. 361195)

000 -LEADER
fixed length control field 00489pam a2200169a 44500
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 160408b2008 xxu||||| |||| 00| 0 eng d
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 9783540766629
082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER
Classification number 621.38152
Item number R22
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name
245 1# - TITLE STATEMENT
Title Reactive sputter deposition
Statement of responsibility, etc. edited by D. Depla
260 ## - PUBLICATION, DISTRIBUTION, ETC.
Place of publication, distribution, etc. Berlin
Name of publisher, distributor, etc. Springer
Date of publication, distribution, etc. 2008
300 ## - PHYSICAL DESCRIPTION
Extent xviii, 570p.
440 ## - SERIES STATEMENT/ADDED ENTRY--TITLE
Title Springer Series In Materials Science
Volume/sequential designation
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Cathode Sputtering (Plating Process)
700 ## - ADDED ENTRY--PERSONAL NAME
Personal name Mahieu, S.,Ed.
997 ## -
-- A161826 s C
Holdings
Withdrawn status Lost status Damaged status Not for loan Collection code Permanent Location Current Location Date acquired Cost, normal purchase price Full call number Barcode Date last seen Uniform Resource Identifier Price effective from Koha item type
        COMPACT STORAGE (BASEMENT) PK Kelkar Library, IIT Kanpur PK Kelkar Library, IIT Kanpur 2008-04-08 9607.56 621.38152 R22 A161826 2016-04-08 Book Request 2016-04-08 Books

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