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537/.24
Kim, Young-Hee, 1972-
       Hf-based high-k dielectrics : process development, performance characterization, and reliability / [electronic resource] : / Young-Hee Kim, Jack C. Lee. .- 1st ed. .- San Rafael, Calif. (1537 Fourth Street, San Rafael, CA 94901 USA) :: Morgan & Claypool Publishers,, c2005. .- 1 electronic text (x, 92 p. : ill.) :. digital file. ** Synthesis lectures on solid state materials and devices, * #1 1932-1724 ; )
QC585 / .K554 2005 - Synthesis lectures on solid state materials and devices, #1. .
Series from website. Part of : Synthesis digital library of engineering and computer science.
Includes bibliographical references (p. 86-90).
Abstract freely available; full-text restricted to subscribers or individual document purchasers.
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System requirements: Adobe Acrobat Reader.
Mode of access: World Wide Web.
ISBN: 1598290045 (electronic bk.) 9781598290059 (electronic bk.)
10.2200/S00005ED1V01Y200508SSM001 doi
Subject Headings:
Dielectrics.;
Hafnium oxide.;
Integrated circuits;--Reliability.
Semiconductors;--Junctions.
Breakdown (Electricity);
Metal oxide semiconductor field-effect transistors.;
Author Added Entry:
Lee, Jack Chung-Yeung.;
Copy Details:
Acc. No.: EBKE017, Full Call No.: , Item type: E books , Location: ,
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