Metal oxide-based thin film structures : formation, characterization and application of interface-based phenomena
Contributor(s): Pryds, Nini, [ ed.] | Esposito, Vincenzo, [ed.].Series: Metal oxides series. / edited by Ghenadii Korotcenkov.Publisher: Amsterdam Elsevier 2018Description: xxiv, 536p.ISBN: 9780128111666.Subject(s): Thin films | Metallic oxidesDDC classification: 530.4275 | M564
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Metal Oxide-Based Thin Film Structures: Formation, Characterization and Application of Interface-Based Phenomena bridges the gap between thin film deposition and device development by exploring the synthesis, properties and applications of thin film interfaces.
Part I deals with theoretical and experimental aspects of epitaxial growth, the structure and morphology of oxide-metal interfaces deposited with different deposition techniques and new developments in growth methods. Part II concerns analysis techniques for the electrical, optical, magnetic and structural properties of thin film interfaces. In Part III, the emphasis is on ionic and electronic transport at the interfaces of Metal-oxide thin films.
Part IV discusses methods for tailoring metal oxide thin film interfaces for specific applications, including microelectronics, communication, optical electronics, catalysis, and energy generation and conservation.
This book is an essential resource for anyone seeking to further their knowledge of metal oxide thin films and interfaces, including scientists and engineers working on electronic devices and energy systems and those engaged in research into electronic materials.
Introduces the theoretical and experimental aspects of epitaxial growth for the benefit of readers new to the field
Explores state-of-the-art analysis techniques and their application to interface properties in order to give a fuller understanding of the relationship between macroscopic properties and atomic-scale manipulation
Discusses techniques for tailoring thin film interfaces for specific applications, including information, electronics and energy technologies, making this book essential reading for materials scientists and engineers alike